Mask Cleaning Machine - Company Ranking(5 companies in total)
Last Updated： Aggregation Period:Sep 09, 2026〜Oct 06, 2026
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| ■Main Features - Annual reduction of mask costs by around 100,000,000 yen* - Easy removal of resist adhered to the mask - Easy removal... | ■Design rule L/S (Line and Space) optimal for cleaning photomasks with a size of 1μm or more FPD (Flat Panel Display), MEMS devices, fine p... | ||
| ■Main Features - Quickly performs 【scrub cleaning, rinsing, and drying】 of workpieces with a single device. - Special brushes for scrub ... | Photomask: for semiconductors, for liquid crystals, for organic EL, for thin-film devices, for IC packages, for PWBs, for FPCs, and others, ... | ||
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TECHNOVISION, INC. main office
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- Featured Products
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Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"
- overview
- ■Main Features - Annual reduction of mask costs by around 100,000,000 yen* - Easy removal of resist adhered to the mask - Easy removal...
- Application/Performance example
- ■Design rule L/S (Line and Space) optimal for cleaning photomasks with a size of 1μm or more FPD (Flat Panel Display), MEMS devices, fine p...
Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302
- overview
- ■Main Features - Quickly performs 【scrub cleaning, rinsing, and drying】 of workpieces with a single device. - Special brushes for scrub ...
- Application/Performance example
- Photomask: for semiconductors, for liquid crystals, for organic EL, for thin-film devices, for IC packages, for PWBs, for FPCs, and others, ...
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TECHNOVISION, INC. main office
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